Photoresist developing system for metal sign

Features:The metal sign photoresist developing system is designed for  photoresist film development, featuring auto spray imaging and a high-precision oscillation system.

Working Principle

The photoresist developing system for metal sign works by spray developing solution to remove unexposed photoresist from a metal board. After UV exposure, the machine uses chemical developers to dissolve the unwanted resist, revealing the pattern. Adjustable settings control temperature, spray pressure, speed and time for precise development and accuracy.

Process Flow: Load → Developing→ Unload

Main Technical Parameters:
– Model: GE-xy650
– Power: 3KW/380V
– Conveyor Widths: 400/650/800/1000/1200/1500mm
– Working Height: 800±50mm
– Developing Area Length:1000mm
– Rinse Area Length: 200mm
– Working Temperature: 38~65°C
– Tolerance: 0.05mm
– Developing Type: Double side spray
– Dimensions: 2550x1600x1400mm
– Weight: 300kg

Control Systems:
– Speed Adjustment
– Pressure Adjustment
– Temperature Control (Heater)
– Network Filter System
– High-temperature PP Material (up to 100°C)
– Long-time working Capability

Common Processes:
– Developing (Stand Alone)
– Developing → Rinse → Drying
– DES (Develop → Etch → Strip)
– Custom Sizes (1 to as many chambers as needed)

Common Chemicals:
– 1% Potassium Carbonate
– 1% Sodium Carbonate

Applications:
– PCB Manufacture
– Metal Etching
– Electroplating
– Electroforming Stickers

Compatible Resists:
– Dry film photoresists
– Liquid photoresists
– Solder mask resist (dry and liquid)

Machine  video：

 

Related equipment ：

Photoresist Developing Machine

developing machines for PCB

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